Brief introduction of sputtering target materials

- Jul 20, 2017-

Magnetron sputtering coating is a new type of physical vapor deposition, and the 2013 evaporation coating method has obvious advantages in many aspects. As a mature technology, magnetron sputtering has been applied in many fields.

1 Sputtering technology

Sputtering is one of the main technologies for the preparation of thin film materials, which use ions generated by ion sources to accelerate aggregation in vacuum. And the formation of high velocity energy ion beam, bombardment of the solid surface, ions and solid surface atoms of the kinetic energy exchange, so that the solid surface of atoms away from the solid and deposited on the surface of the substrate, the bombardment of the solid film deposition of the raw materials, known as sputtering targets. All kinds of sputtering film materials are widely used in semiconductor integrated circuit, recording medium, planar display and workpiece surface coating.

2 main applications

Sputtering target materials are mainly used in electronics and information industry, such as integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices, etc. can also be used in the field of glass coating, and may be used in wear-resistant materials, high-temperature corrosion, high-grade decorative supplies and other industries.


According to the shape can be divided into long target, square target, round target, shaped target

According to the ingredients can be divided into metal target materials, alloy targets, ceramic compounds target materials

According to the application, it is divided into semiconductor related ceramic target material, recording medium ceramic target, display ceramic target, superconducting ceramic target and giant magnetoresistance ceramic target, etc.

According to the application field is divided into microelectronics target material, magnetic record target material, optical disc target material, precious metal target material, thin film resistor target material, conductive film target material, surface modification target material, light cover layer target material, decoration layer target material, electrode target material, encapsulation target material, other target material