The sputtering target is sputtered on the substrate by magnetron sputtering, multi arc ion plating or other type of coating system in the proper process condition.
In simple words, the target material is the high speed charged particle bombardment target materials, used in high-energy laser weapons, different power density, different output waveform, different wavelength of laser and different target material interaction, will produce different destruction effect. For example: evaporation magnetron sputtering coating is heating evaporation coating, aluminum film and so on. Replacement of different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), can be different film systems (such as superhard, wear-resistant, anti-corrosion alloy film, etc.).