Development History Of Target Materials

- Jul 20, 2017-

Various types of sputtering film materials are widely used in semiconductor integrated circuits (VLSI), optical discs, planar displays and surface coatings of workpieces. Since the 1990s, the development of sputtering target materials and sputtering technology has greatly met the needs of the development of various new electronic components.

For example, in the semiconductor integrated circuit manufacturing process, with low resistivity copper conductor film instead of aluminum film wiring: In the flat display industry, a variety of display technologies (such as LCD, PDP, OLED and the Fed, and so on, some have been used for computer and computer display manufacturing; In the information storage industry, the storage capacity of magnetic memory is increasing, and new magneto-optical recording materials are constantly being introduced, which require more and more requirements for the quality of sputtering target materials, The number of demand has also increased year by year.