Effect Of Target Material Quality On Production Of Large-area Coating

- Jul 20, 2017-

Most modern buildings have begun to use large-area glass lighting, which brings us brighter rooms and wider horizons, on the other hand, the heat energy passing through the glass is much higher than the weekend wall, resulting in a significant increase in the energy consumption of the whole building. After decades of development, low-e coated glass has been widely used in the field of architecture, which has a significant effect on reducing building energy consumption and saving energy. At present, the technology of preparing low radiation coating includes chemical vapor deposition (on-line-e) and vacuum magnetron sputtering coating (off-line lower-e). On-line low–e glass with a relatively single, high emissivity, off-line low–e glass radiation rate and heat insulation coefficient is lower, color variety, shading coefficient and transmittance can be adjusted according to the requirements of designers, prepared into hollow glass or laminated glasses for use, more suitable for social development for energy-saving more and more demanding, is the inevitable trend of social development. Compared with the developed countries up to 90% of the use of low radiation glass, China's low–e glass penetration rate of only about 12%, its in China has a very large space for development. Single compared to ordinary glass and online low–e glass, the production cost of off-line low–e glass is higher, which restricts its application to a certain extent, and the domestic glass processing enterprises have the obligation to reduce the production cost of the coating products, so as to accelerate the popularization process of the low radiation glass, save energy, improve the environment and realize the sustainable development of the society.

The vacuum magnetron sputtering coating can effectively reduce the working pressure of the target chamber and the working voltage of the target, increase the sputtering and deposition rate, reduce the substrate temperature and reduce the damage of the plasma to the film layer, especially suitable for the production of large area coating. The factors affecting the velocity and quality of sputtering film include vacuum degree, sputtering atmosphere, air pressure, using a series of equipment conditions such as power and target base distance, the target material, as the bulk raw material used in the coating, has a great influence on the film quality and sputtering rate, including the shape, purity, density, porosity, grain size and binding quality of the target material. High-quality target material not only can guarantee good film quality, but also can guarantee good film quality, can also prolong the use cycle of low–e products, more important can reduce production cost, improve production efficiency, and have great economic benefit to the coating glass industry. Therefore, for large-area coating industry, the research of target materials is also very important.