Carbon Sputtering Target C Target Purity 3N-5N for STN, TP and TFT

Carbon Sputtering Target C Target Purity 3N-5N for STN, TP and TFT

Carbon target, CAS:7782-42-5, is of gray metallic luster, in shape of ring flake, wafer, melting point: 3550℃, density: 2.27g/cm3, purity: 99.9%-99.999%. It mainly manufactured through vacuum sintering furnace, hot isostatic pressing, precision machining. It’s is widely used in magnetron...

Product Details

Carbon target, CAS:7782-42-5, is of gray metallic luster, in shape of ring flake, wafer, melting point: 3550℃, density: 2.27g/cm3, purity: 99.9%-99.999%. It mainly manufactured through vacuum sintering furnace, hot isostatic pressing, precision machining. It’s is widely used in magnetron sputtering for sapphire, STN, Ai, TFT, TP, LCD, vehicle navigation, glass, semiconductor, diamond etc..


  图片44.jpg


      图片12.jpg

      图片14.jpg

      图片16.jpg

      图片18.jpg

      图片20.jpg

      图片22.jpg

Inquiry